Abstract
A technique for injecting a vertical Bloch line (VBL) pair into a stripe domain head has been developed. This method utilizes horizontal Bloch line punch-through at the flank wall and successive domain chopping. The method is more practical than that of pushing the stripe domain head. In the new method, the domain is only controlled to lie beneath the conductor pattern for a VBL pair injection. Experimentally, a result of VBL pair injection is shown using 5 µm bubble garnet film and a reasonable margin is obtained in the pulsed bias field vs its width.

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