Vanadium self-diffusion in pure vanadium and in dilute vanadium-iron and vanadium-tantalum alloys

Abstract
Our results confirm the existence of three regimes: (1) free single vacancy migration between 1200 and 1550°C, (2) divacancy contribution at higher temperatures and (3) acceleration of diffusion due to other defects such as dislocations, subgrain boundaries and/or vacancy-interstitial impurity pairs at low temperatures.