Vanadium self-diffusion in pure vanadium and in dilute vanadium-iron and vanadium-tantalum alloys
- 1 April 1983
- journal article
- Published by Taylor & Francis in Philosophical Magazine Part B
- Vol. 47 (4) , 515-528
- https://doi.org/10.1080/13642818308246454
Abstract
Our results confirm the existence of three regimes: (1) free single vacancy migration between 1200 and 1550°C, (2) divacancy contribution at higher temperatures and (3) acceleration of diffusion due to other defects such as dislocations, subgrain boundaries and/or vacancy-interstitial impurity pairs at low temperatures.Keywords
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