XRD and SEM studies of reactively deposited tin oxide thin films
Open Access
- 1 September 1995
- journal article
- Published by Springer Nature in Bulletin of Materials Science
- Vol. 18 (5) , 557-562
- https://doi.org/10.1007/bf02744841
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Characterization of SnO2 films deposited by d.c. gas discharge activating reaction evaporation onto amorphous and crystalline substratesThin Solid Films, 1993
- Layer-by-layer growth of epitaxial SnO2 on sapphire by reactive sputter depositionApplied Physics Letters, 1992
- Preparation and characterization of some tin oxide filmsThin Solid Films, 1988
- Transparent conductors—A status reviewThin Solid Films, 1983
- Preparation by reactive deposition and some physical properties of amorphous tin oxide films and crystalline SnO2 filmsThin Solid Films, 1981