X-ray lithography
- 1 December 1985
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 3 (1-4) , 535-556
- https://doi.org/10.1016/0167-9317(85)90067-x
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Heating and temperature-induced distortions of silicon x-ray masksJournal of Vacuum Science & Technology B, 1983
- Investigations of x-ray exposure using plane scanning mirrorsJournal of Vacuum Science & Technology B, 1983
- A steady-state fluid model of the coaxial plasma gunPhysics Letters A, 1979
- Laser-Plasma Source For Pulsed X-Ray LithographyPublished by SPIE-Intl Soc Optical Eng ,1978