Electronic and chemical analysis of fluoride interface structures at subnanometer spatial resolution

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Abstract
Using a finely focused beam of 100 keV electrons of less than 0.5 nm diam we have been able to analyze changes in the transmission electron energy loss spectra (EELS) at subnanometer spatial resolution as the electron probe is moved across various fluoride interface structures. In addition, using the method of dose resolved EELS we have been able to determine the radiation chemistry of CaF2 beam exposure.