Investigation of the Effects of Very Low Pressure Chemical Vapor Deposited TiSi2 on Device Electrical Characteristics
- 1 October 1989
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 136 (10) , 2989-2993
- https://doi.org/10.1149/1.2096389
Abstract
The anodic oxidation of ordered Cu/Au alloys was studied by quartz crystal microbalance measurements and quartz crystal impedance spectroscopy. A fast impedance measurement technique is presented, which allows us to monitor the surface microstructure during the selective dissolution. We learn that the state of the alloy surface characterized by impedance measurements after the oxidation is not necessarily equal to that during the oxidation.Keywords
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