Propagation loss measurements in silicon-on-insulator optical waveguides formed by the bond-and-etchback process
- 30 September 1991
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 59 (14) , 1667-1669
- https://doi.org/10.1063/1.106262
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Comparison of film thickness tolerances in waveguide grating couplersOptics Letters, 1991
- Optical waveguides in SIMOX structuresIEEE Photonics Technology Letters, 1991
- Bonding of silicon wafers for silicon-on-insulatorJournal of Applied Physics, 1988
- Optical waveguides in oxygen-implanted buried-oxide silicon-on-insulator structuresOptics Letters, 1988
- Refractive Index of SiliconApplied Optics, 1971