Temperature dependent field effect conductance in a-Si:H
- 1 December 1983
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 59-60, 281-284
- https://doi.org/10.1016/0022-3093(83)90576-8
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Effect of discharge conditions on characteristics of hydrogenated amorphous silicon deposited by DC glow discharge decompositionSolar Energy Materials, 1982
- Pseudogap state density in sputtered a-Si:H from field effect and capacitance measurementsApplied Physics Letters, 1981
- Analysis of field-effect and capacitance–voltage measurements in amorphous semiconductorsPhilosophical Magazine Part B, 1980
- Recombination in plasma-deposited amorphous Si:H. Luminescence decayPhysical Review B, 1979