Fabrication of submicron Josephson microbridges using optical projection lithography and liftoff techniques
- 1 January 1978
- proceedings article
- Published by AIP Publishing in AIP Conference Proceedings
- Vol. 44 (1) , 317-321
- https://doi.org/10.1063/1.31357
Abstract
We describe the fabrication of sub‐micron, type II microbridges, using a reflected‐light microscope for high‐resolution, projection photolithography and metal liftoff techniques for precise pattern transfer. Microbridges as narrow as 2000 Å have been produced. The novel technique of through‐the‐substrate exposure, which gives extremely sharp edge definition, is discussed, as well as other factors determining resolution and liftoff yield. We present experimental results for a 0.2 μm wide Pb 0.86In0.14 microbridge with a device resistance of 5.5Ω. Finally, we consider the general applicability of these fabrication techniques.Keywords
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