Atomic control of layer-by-layer epitaxial growth onMolecular-dynamics simulations
- 15 November 1997
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 56 (20) , 13535-13542
- https://doi.org/10.1103/physrevb.56.13535
Abstract
Molecular-dynamics simulations were performed to clarify the structures of SrO and BaO layers on a substrate at the atomic level, and to predict an appropriate buffer layer for heterojunction. The atomic structure of these layers grown on a substrate terminated on the atomic plane was investigated. From the analysis of the angle distribution of Sr-O-Sr and the radial distribution between Sr and O, the first single SrO layer on the substrate was found to keep a perfect NaCl-type structure. However, the structure of the second SrO layer deviated from a NaCl-type structure. This result suggests that only a single SrO layer is able to grow epitaxially and uniformly on the substrate terminated on the atomic plane. Since a BaO layer is one component of the layered structure, a detailed understanding of the heterojunction has been desired. Here, the stress induced by the lattice mismatch of the and heterojunction was evaluated. The gained 1.2 GPa stress, while surprisingly the did not have any stress. Moreover, the BaO layer was found to grow epitaxially and uniformly on the Note that is expected to grow epitaxially on a BaO layer since the BaO layer is a part of the layered structure. Hence, we suggest that BaO/SrO is a suitable buffer layer for the heterojunction.
Keywords
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