Preparation and properties of nonstoichiometric MnAlGe thin films
- 1 April 1973
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 44 (4) , 1756-1758
- https://doi.org/10.1063/1.1662443
Abstract
Films of MnAlGe which are nonstoichiometric have been prepared by rf sputtering. Structural, magnetic, and optical properties of these films have been determined. The Curie temperature of films with excess aluminum has been found to be as low as 190°C. The crystallographic orientation of these films may be adjusted by proper choice of substrate temperature.This publication has 6 references indexed in Scilit:
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- Manganese gallium germanide-a new ferromagnetic materialJournal of Applied Physics, 1973
- MnAlGe Films for Magneto-Optic ApplicationsJournal of Applied Physics, 1971
- Cation Deficiencies in RF Sputtered Gadolinium Iron Garnet FilmsIBM Journal of Research and Development, 1969
- Influence of Milling upon the Magnetic Properties of the Intermetallic Compound MnAlGeJournal of Applied Physics, 1963
- New Magnetic Ternary Compound with a High Crystalline AnisotropyJournal of Applied Physics, 1961