Low-field tunnelling current in thin-oxide m.n.o.s. memory transistors

Abstract
An expression for the tunnelling current between the silicon bands and the traps located in the silicon nitride, in thin-oxide m.n.o.s. memory transistors under low-field conditions, is derived. The theoretical results are compared with available experimental data, and the parameters for the trap distribution are calculated. The agreement with experimental results is satisfactory.

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