Radiation enhanced diffusion in Kr + bombarded Ni—Yb films

Abstract
Ion beam mixing of Yb coated nickel films has been studied using Kr+ and O2 + bombardment. The use of a nickel overlayer was found to be effective in protecting the films from oxidation. By assuming the validity of a simple solution of the diffusion equation, effective diffusion coefficients at different Kr+ bombardment temperatures were obtained for Yb/Ni mixing. The diffusion was linear with an apparent activation energy of (0.18±0.03) eV. This result is discussed in the light of radiation enhdnced diffusion and cascade mixing theory. No mixing was observed with O2+ bombardment. This indicates that the chemical nature of the ions used is of importance and it is suggested that trapping of oxygen atoms in the impurity film is responsible for this effect.

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