The effect of ion-implanted yttrium on the oxidation of nickel
- 15 August 1989
- journal article
- Published by Elsevier in Materials Science and Engineering: A
- Vol. 116, 119-127
- https://doi.org/10.1016/0921-5093(89)90136-6
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Effect of yttrium additions on the oxidation of nickelOxidation of Metals, 1985
- The influence of implanted dopants on stresses and diffusion processes in NiO films during thermal oxidation of NiNuclear Instruments and Methods in Physics Research, 1983
- The oxidation of chromium- and nickel-implanted nickel at high temperaturesCorrosion Science, 1982
- A quantitative demonstration of the grain boundary diffusion mechanism for the oxidation of metalsPhilosophical Magazine A, 1982
- Improvements in high temperature oxidation resistance by additions of reactive elements or oxide dispersionsPhilosophical Transactions of the Royal Society of London. Series A, Mathematical and Physical Sciences, 1980
- General Relationship for the Thermal Oxidation of SiliconJournal of Applied Physics, 1965