Sub-10 nm Electron Beam Nanolithography Using Spin-Coatable TiO2 Resists
- 1 October 2003
- journal article
- research article
- Published by American Chemical Society (ACS) in Nano Letters
- Vol. 3 (11) , 1587-1591
- https://doi.org/10.1021/nl034584p
Abstract
No abstract availableKeywords
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