Reversibility and irreversibility in the formation and reduction of oxide film states on Co at ambient and low temperatures
- 30 August 1993
- journal article
- Published by Elsevier in Journal of Electroanalytical Chemistry
- Vol. 355 (1-2) , 79-96
- https://doi.org/10.1016/0022-0728(93)80355-l
Abstract
No abstract availableThis publication has 21 references indexed in Scilit:
- Irreversibility in formation of nominal monolayer and sub-monolayer levels of surface oxide attained at Fe at low temperaturesJournal of Electroanalytical Chemistry and Interfacial Electrochemistry, 1991
- Realization of monolayer levels of surface oxidation of nickel by anodization at low temperaturesJournal of Electroanalytical Chemistry and Interfacial Electrochemistry, 1990
- Elementary steps of electrochemical oxidation of single-crystal planes of Au—I. Chemical basis of processes involving geometry of anions and the electrode surfacesElectrochimica Acta, 1986
- Published by Elsevier ,1980
- The role of ion adsorption in surface oxide formation and reduction at noble metals: General features of the surface processJournal of Electroanalytical Chemistry and Interfacial Electrochemistry, 1979
- Anodic Oxidation of Cobalt in Neutral and Basic SolutionJournal of the Electrochemical Society, 1978
- Reversibility and Growth Behavior of Surface Oxide Films at Ruthenium ElectrodesJournal of the Electrochemical Society, 1978
- The real condition of electrochemically oxidized platinum surfacesJournal of Electroanalytical Chemistry and Interfacial Electrochemistry, 1973
- Anodic oxidation of cobalt in potassium hydroxide electrolytesJournal of Electroanalytical Chemistry and Interfacial Electrochemistry, 1971
- The Kinetics of Anodic Oxidation of Iron in Neutral SolutionJournal of the Electrochemical Society, 1964