Characterization of Silicon Surface Contamination and Near‐Surface Damage Caused by C 2 F 6 / CHF 3 Reactive Ion Etching
- 1 August 1990
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 137 (8) , 2634-2639
- https://doi.org/10.1149/1.2087000
Abstract
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