Decomposition Property of Methylhydrazine with Titanium Nitridation at Low Temperature

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Abstract
We studied the thermal decomposition properties of methylhydrazine (MH) which is used in the chemical vapor deposition (CVD) of titanium‐nitride . The decomposition was carried out on the surfaces of silicon dioxide and titanium (Ti) at low pressures. The by‐products were detected by the gas chromatography mass‐spectrometry (GCMS), and surfaces were analyzed by electron spectroscopy for chemical analysis and Auger electron spectroscopy. MH decomposed on surface above 400°C, producing methane , ammonia , and monomethylamine (MMA). Above 650°C, and were predominantly generated instead of MH. The decomposition temperature on the Ti substrate was 200°C and was even lower than the temperature on . As the substrate temperature increased, Ti was converted to approaching a stoichiometric around 500°C. As a result, MMA was observed around 400°C. Due to the formation of and its poor capability for donating electrons rather than Ti, the MH decomposition rate was reduced as temperature increased above 400°C.

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