Characteristics of a Photoresist Hologram and Its Replica
- 1 June 1974
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 13 (6) , 1327-1336
- https://doi.org/10.1364/ao.13.001327
Abstract
The characteristics of the surface relief hologram which is produced by a photoresist and its replica by an embossing method are experimentally studied. It becomes clear that the maximum diffraction efficiency of the photoresist hologram and that of the replica hologram are almost the same value—21–25%—and the maximum SNR of the original hologram and its replica are fairly good.Keywords
This publication has 10 references indexed in Scilit:
- Holographic properties of chalcogenide-metal photosensitive materialsOptics Communications, 1973
- Modulation Transfer Function of AZ111 PhotoresistApplied Optics, 1971
- The Use of Photoresist as a Holographic Recording MediumApplied Optics, 1970
- HOLOGRAPHY Embossed Hologram Motion Pictures for Television PlaybackApplied Optics, 1970
- Write–Read–Erase in Situ Optical Memory Using Thermoplastic HologramsApplied Optics, 1970
- Properties and Limitations of Hologram Recording MaterialsApplied Optics, 1969
- Spectrographic performance of holographically made diffraction gratingsOptics Communications, 1969
- PRODUCTION OF BLAZED HOLOGRAMSApplied Physics Letters, 1968
- Copying HologramsApplied Optics, 1966
- Copying HologramsApplied Optics, 1966