FTIR Studies of the Adsorption/Desorption Behavior of Cu Chemical Vapor Deposition Precursors on Silica: IV . Interaction of (1,1,1,5,5,5‐hexafluoroacetylacetonato)(2‐butyne)copper(I), and (1,1,1,5,5,5,‐hexafluoroacetylacetonato)(vinyltrimethylsilane)copper(I), with Passivated Silica Surfaces and Comparison to Selective CVD of Cu
- 1 December 1994
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 141 (12) , 3547-3555
- https://doi.org/10.1149/1.2059368
Abstract
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