A system for i n s i t u studies of plasma–surface interactions using x-ray photoelectron spectroscopy

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Abstract
A system is described in which plasma/surface treatments can be performed and the substrates can be analyzed by x-ray photoelectron spectroscopy by transferring them via a load lock into the analytic chamber. Also described are some plasma etching experiments that demonstrate the utility of this apparatus. The system emulates larger systems in which plasma treatments are performed at pressures, voltages, and power densities similar to those employed in large commercial systems.

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