Effect of substrate pretreatment on diamond deposition
- 13 April 1993
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 2 (5-7) , 758-761
- https://doi.org/10.1016/0925-9635(93)90218-q
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Nucleation and growth of diamond in a microwave plasma on substrate pretreated with non-oxide ceramic particlesJournal of Crystal Growth, 1992
- Textured diamond growth on (100) β-SiC via microwave plasma chemical vapor depositionApplied Physics Letters, 1992
- High-resolution scanning electron microscopy study on the early stage of diamond synthesis by microwave-plasma chemical vapour depositionJournal of Materials Science Letters, 1992
- Early formation of chemical vapor deposition diamond filmsApplied Physics Letters, 1990
- The analysis of defect structures and substrate/film interfaces of diamond thin filmsJournal of Crystal Growth, 1990
- Early stages of plasma synthesis of diamond filmsApplied Physics Letters, 1989
- Growth of diamond thin films by dc plasma chemical vapor depositionApplied Physics Letters, 1987
- Chemical vapour deposition of diamond in RF glow dischargeJournal of Materials Science Letters, 1985
- Diamond synthesis from gas phase in microwave plasmaJournal of Crystal Growth, 1983
- Growth of diamond particles from methane-hydrogen gasJournal of Materials Science, 1982