Kinetics of surface reactions of CF3 radicals
- 1 November 1987
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 5 (6) , 3351-3358
- https://doi.org/10.1116/1.574195
Abstract
The kinetics of reactions of CF3 radicals on various substrate materials has been studied in a gold-coated, stainless-steel, very-low-pressure photolysis (VLPΦ) cell as a function of temperature and radical concentration. The substrate materials were gold, stainless steel, copper, copper oxide, and silica. The CF3 radicals were generated from CF3I by IR-multiphoton decomposition. The reaction products observed with a mass spectrometer included HF, CO, CO2, COF2, SiF4, and C2F6. Rate constants were obtained as a function of temperature. CF3 reacted most rapidly on copper oxide surfaces; the other metal surfaces were less reactive, and the silica surfaces were least reactive. Previous studies from this laboratory that had reported the reaction of CF3 on fused silica are reinterpreted as reactions of CF3 on the stainless-steel heater assembly.Keywords
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