Soft X-ray reflectometry applied to the evaluation of surface roughness variation during the deposition of thin films
- 1 January 1988
- journal article
- Published by EDP Sciences in Revue de Physique Appliquée
- Vol. 23 (10) , 1645-1652
- https://doi.org/10.1051/rphysap:0198800230100164500
Abstract
Thin films of boron, silicon and tungsten-rhenium materials were prepared by vapor deposition in a high vacuum system. During the deposition, the reflectivity was measured using the carbon Ka line (A = 4.47 nm). The surface roughness evolution was calculated as a function of thickness from the soft X-ray reflectance of the films. It was found that the mean square deviation of the surface height is proportional to the average thickness. A statistical model is proposed to explain this behaviour ; it rests on the random condensation process of evaporated particules and takes into account the role of incident kinetic energy of adatoms in disordered thin film growthKeywords
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