Homoepitaxial growth of iron and a real space view of reflection-high-energy-electron diffraction
- 7 June 1993
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 70 (23) , 3615-3618
- https://doi.org/10.1103/physrevlett.70.3615
Abstract
We report real space views of the homoepitaxial growth of Fe on Fe(001) whiskers observed by scanning tunneling microscopy. A measure of the surface diffusion of the Fe atoms is obtained over the temperature range of 20–250 °C. The effect of the diffusion kinetics is observed in the surface morphology as a decrease in the interface width with temperature. Measurements of reflection-high-energy-electron diffraction during growth allow a comparison of real and reciprocal space techniques.Keywords
This publication has 16 references indexed in Scilit:
- Scaling analysis of surface roughness and Bragg oscillation decay in models for low-temperature epitaxial growthSurface Science, 1992
- Measurements of dynamic scaling from epitaxial growth front: Fe film on Fe(001)Physical Review Letters, 1992
- Scaling analysis of diffusion-mediated island growth in surface adsorption processesPhysical Review B, 1992
- Surface evolution during molecular-beam epitaxy deposition of GaAsPhysical Review Letters, 1992
- Surface self-diffusion of Si on Si(001)Surface Science, 1992
- Activation energy for surface diffusion of Si on Si(001): A scanning-tunneling-microscopy studyPhysical Review Letters, 1991
- Birth-death models of epitaxy: I. Diffraction oscillations from low index surfacesSurface Science, 1989
- On the origin of RHEED intensity oscillationsJournal of Crystal Growth, 1989
- Origin of Reflection High-Energy Electron-Diffraction Intensity Oscillations during Molecular-Beam Epitaxy: A Computational Modeling ApproachPhysical Review Letters, 1987
- Rate equation approaches to thin film nucleation kineticsPhilosophical Magazine, 1973