Microwave ion source for ion implantation
- 1 January 1987
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 21 (1-4) , 168-177
- https://doi.org/10.1016/0168-583x(87)90819-6
Abstract
No abstract availableThis publication has 24 references indexed in Scilit:
- First Operation of the LBL ECR Ion Source with the 88-Inch CyclotronIEEE Transactions on Nuclear Science, 1985
- High energy ion implantation for C-MOS isolation n-wells technology: Problems related to the use of multicharged phosphorous ions in an industrial contextNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Electron Cyclotron Resonance Multiply Charged Ion SourcesIEEE Transactions on Nuclear Science, 1976
- A multipurpose highly charged ion sourceNuclear Instruments and Methods, 1975
- Anomalous absorption of intense electromagnetic waves in plasma at high magnetic fieldsPlasma Physics, 1974
- Study of the characteristics of the ion beam extracted from an rf discharge in hydrogen under conditions of resonanceJournal of Applied Physics, 1974
- Off-resonance microwave-created plasmasPlasma Physics, 1973
- The efficient inject of high microwave powers into the overdense magnetoactive plasma in the waveguideCzechoslovak Journal of Physics, 1973
- Effect of the polarization of the electromagnetic wave on wave energy absorption caused by the linear transformation of wavesCzechoslovak Journal of Physics, 1972
- A new ion source for electromagnetic isotope separatorsNuclear Instruments and Methods, 1963