Inspection for defects of a mask containing one‐ to submicrometer patterns using a scanning electron microscope and feature extraction method

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Abstract
The automatic inspection for defect of x‐ray patterns using a scanning electron microscope and feature extraction is proposed. A new algorithm in feature extraction method for the automatic inspection is contrived. After confirming the feasibility of the algorithm by computer simulation, this inspection method is applied to the SEM image of an actual x‐ray mask containing a few‐micrometer patterns and the defect of 0.5 μm in size can be extracted successfully. It is found that this new method is a very suitable one for the automatic inspection for the defect of x‐ray masks containing one‐ to submicrometer patterns.