Increasing resolution and depth of focus in optical microlithography through spatial filtering techniques
- 1 March 1992
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 17 (1-4) , 93-97
- https://doi.org/10.1016/0167-9317(92)90019-n
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Edge-ringing in Partially Coherent ImagingOptica Acta: International Journal of Optics, 1977
- Use of Annular Apertures to Increase Focal DepthJournal of the Optical Society of America, 1960
- On the diffraction theory of optical imagesProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1953