Effect of the oxygen pressure during sputtering on the properties of thin CuOx films
- 1 February 1982
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 88 (1) , 33-39
- https://doi.org/10.1016/0040-6090(82)90347-9
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
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