Kinetics of Thermal Decomposition of TiH2

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Abstract
The thermal decomposition rate of TiH2 over the temperature range 250–500 °C (523–773 K) in a continuously pumped vacuum system was found to be much slower than predicted from diffusion model calculations. The rate was insensitive to the presence of oxygen in the environment and on the specimen surface; however, small amounts of residual hydrogen in the chamber decreased the rate considerably. The rate controlling process appears to be the reaction between hydrogen atoms to form gaseous molecules on the surface. When specimens were decomposed in flowing helium, the rate was slower than in vacuum, indicating that diffusion of hydrogen through a gaseous boundary layer on the surface can control the rate when a second gas is present.

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