Studies of SiO2 and SiSiO2 interfaces by XPS
- 2 July 1979
- journal article
- Published by Elsevier in Surface Science
- Vol. 86, 555-561
- https://doi.org/10.1016/0039-6028(79)90434-5
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
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- A high-resolution electron microscopy study of the Si-SiO2 interfaceApplied Physics Letters, 1978
- New studies of the Si-SiO2 interface using auger sputter profilingSolid State Communications, 1978
- Experimental Observations of the Chemistry of the SiO2/Si InterfaceIEEE Transactions on Nuclear Science, 1977
- Thickness distribution in thin filmsThin Solid Films, 1977
- Properties of the silicon–SiO2 interfaceJournal of Vacuum Science and Technology, 1977
- Thickness Distribution in Thin FilmJapanese Journal of Applied Physics, 1977
- Field dependent internal photoemission probe of the electronic structure of the Si–SiO2 interfaceJournal of Vacuum Science and Technology, 1976
- The Current Understanding of Charges in the Thermally Oxidized Silicon StructureJournal of the Electrochemical Society, 1974