Photodefinable polyimides. II. The characterization and processing of photosensitive polyimide systems
- 6 January 2003
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- p. 315-321
- https://doi.org/10.1109/ecc.1988.12610
Abstract
Two negative-working photodefinable polyimides with different backbones have been prepared using a four-step synthesis process based on polyiminolactone chemistry. These polyimides have been formulated, coated onto silicon wafers, patterned directly using standard UV microphotolithography, and thermally cured to produce polyimide relief structures. Aspects of the synthesis and processing are discussed, and the properties of the two polyimides after curing are compared.Keywords
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