Determination of the Vapor Pressures of Cesium Fluoride and Cesium Chloride by Means of Surface Ionization

Abstract
A molecular beam of CsF or CsCl effusing from a Knudsen cell was detected with a heated rhenium filament, and the vapor pressure P (in atm) of each halide at a temperature T (in K) was found to be expressed by log10P(CsF)=(7.239±0.072)–(9883±72)⁄T for 630–830 K, log10P(CsCl)=(7.269±0.064)–(10054±66)⁄T for 640–820 K.