The Structure of Plasma-Deposited and Annealed Pseudo-Binary ZrO₂-SiO₂ Alloys

Publisher Website

1 January 2000

journal article
Published by Springer Nature in MRS Proceedings

Vol. 611
https://doi.org/10.1557/proc-611-c1.3.1

Abstract

No abstract available

Keywords

This publication has 2 references indexed in Scilit:

Hafnium and zirconium silicates for advanced gate dielectrics
Journal of Applied Physics, 2000
Remote Plasma Enhanced-Metal Organic Chemical Vapor Deposition of Zirconium Oxide/Silicon Oxide Alloy, (ZrO₂)₁-(SiO₂)_1−x (x:≤0.5), Thin Films for Advanced High-K Gate Dielectrics
MRS Proceedings, 1999