Thin-film capacitors using tantalum oxide dielectrics prepared by reactive sputtering
- 1 July 1961
- journal article
- research article
- Published by Elsevier in Solid-State Electronics
- Vol. 3 (1) , 74-75
- https://doi.org/10.1016/0038-1101(61)90084-3
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Simple, Rapid Sputtering ApparatusReview of Scientific Instruments, 1956
- Reactive sputtering and associated plant designVacuum, 1953