A simple method for the calculation of energy deposition profiles from range data of implanted ions
- 1 April 1977
- journal article
- research article
- Published by Springer Nature in Applied Physics A
- Vol. 12 (4) , 347-353
- https://doi.org/10.1007/bf00886037
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Recoil contribution to ion-implantation energy-deposition distributionsJournal of Applied Physics, 1975
- Ion Implantation Range and Energy Deposition DistributionsPublished by Springer Nature ,1975
- Ion implantation in semiconductors—Part II: Damage production and annealingProceedings of the IEEE, 1972
- Ion implantation in semiconductors—Part I: Range distribution theory and experimentsProceedings of the IEEE, 1968