The corrosion behavior of sputter-deposited AlZr alloys in 1 M HCl solution
- 31 March 1992
- journal article
- Published by Elsevier in Corrosion Science
- Vol. 33 (3) , 425-436
- https://doi.org/10.1016/0010-938x(92)90071-a
Abstract
No abstract availableKeywords
This publication has 16 references indexed in Scilit:
- Anodic polarization behaviour of sputter-deposited AlZr alloys in a neutral chloride-containing buffer solutionElectrochimica Acta, 1991
- Passivity and its breakdown on sputter-deposited amorphous Al-early transition metal alloys in 1 M HCl at 30°CCorrosion Science, 1990
- Evolution of the Chemistry of Passive Films of Sputter‐Deposited, Supersaturated Al AlloysJournal of the Electrochemical Society, 1990
- Pitting of Sputtered Aluminum Alloy Thin FilmsJournal of the Electrochemical Society, 1989
- Surface Chemistry of Sputter‐Deposited Al‐Mo and Al‐Cr Alloys Polarized in 0.1N KClJournal of the Electrochemical Society, 1989
- Surface Charge Considerations in the Pitting of Ion‐Implanted AluminumJournal of the Electrochemical Society, 1988
- Influence of Molybdenum on the Pitting Corrosion of Aluminum FilmsJournal of the Electrochemical Society, 1986
- The Effect of pH of Zero Charge on the Pitting PotentialJournal of the Electrochemical Society, 1986
- The pitting corrosion behavior of rapidly solidified aluminum alloysCorrosion Science, 1986
- A precisely consistent energy calibration method for X-ray photoelectron spectroscopyJournal of Electron Spectroscopy and Related Phenomena, 1976