Structure and properties of refractory compounds deposited by direct evaporation
- 1 January 1977
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 40, 169-182
- https://doi.org/10.1016/0040-6090(77)90116-x
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Structure and microhardness relationships in Ti, Zr and Hf-3Zr carbide deposits synthesized by activated reactive evaporationThin Solid Films, 1974
- Activated Reactive Evaporation Process for High Rate Deposition of CompoundsJournal of Vacuum Science and Technology, 1972
- Effect of Substrate Potential on Al2O3 Films Prepared by Electron Beam EvaporationJournal of Vacuum Science and Technology, 1972
- The nature of precipitates in boron-doped TiCPhilosophical Magazine, 1967