Electron irradiation damage in silicon containing high concentrations of boron-lithium pairs

Abstract
Silicon containing high concentrations of boron of up to 2*1019 cm-3 has been compensated by lithium diffusion and then irradiated in stages at 300K by 2 MeV electrons. Infrared local mode absorption measurements have shown that the latter treatment destroys (B-(s)-Li+(i)) pairs. Initially the boron is displaced into interstitial sites, but aggregation must occur in the later stages while the lithium forms precipitate particles which give rise to optical scatter loss. The observations are compared with previous results for irradiated boron-doped crystals compensated with substitutional donors or for uncompensated samples.

This publication has 17 references indexed in Scilit: