Abstract
The presence of interstitial oxygen molecules in glassy SiO2 has been demonstrated directly by 1064.1 nm (ν=0)(ν=1) excitation of the forbidden O2 molecule Δg1(ν=0)Σg3(ν=0) luminescence transition at 1272 nm in Suprasil W1 fused silica. The interstitial O2 molecules, introduced into glass network during the synthesis process, are destroyed by vacuum ultraviolet or neutron irradiation. Mobile O atoms may play an important role in radiation processes in SiO2. The directly photoexcited luminescence of O2 could be used to detect the presence of O2 in other solid state matrices as well.
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