Low‐Pressure chemical vapour deposition of tantalum pentoxide films for ulsi devices using tantalum pentaethoxide as precursor
- 1 December 1992
- journal article
- Published by Wiley in Advanced Materials for Optics and Electronics
- Vol. 1 (6) , 299-308
- https://doi.org/10.1002/amo.860010607
Abstract
No abstract availableKeywords
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