Comparison of SiO2 Etching Characteristics in DC and RF Magnetron Plasmas.

• 1 January 1999
• journal article
• Published by Institute of Electrical Engineers of Japan (IEE Japan) in IEEJ Transactions on Fundamentals and Materials
• Vol. 119  (4) , 490-495
• https://doi.org/10.1541/ieejfms1990.119.4_490

Abstract