Soft x-ray reduction lithography using multilayer mirrors

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Abstract
A soft x‐ray lithograpy using multilayer mirrors for demagnifying optics and a reflecting mask has been designed and studied experimentally. In this system, a wavelength of 45–130 Å has been selected based on the optical characteristics, the exposed depth of the resist film, and the reflectivity of the multilayer mirror. To obtain a replication pattern resolution of 0.2 μm, the numerical aperture required is estimated to be greater than 0.0125 or 0.0325 for a wavelength of 50 or 130 Å, respectively. These values show that the multilayer optics using two mirrors can be realized to replicate a 0.2 μm pattern. The experiments were performed on the SR beamline BL‐1 of the KEK‐PF storage ring. The Schwarzschild demagnifying optics with a ring field were designed and fabricated. Demagnified exposure patterns of less than 0.5 μm have been obtained using a reflecting mask. The feasibility of the soft x‐ray reduction method using multilayer mirrors has been confirmed. Furthermore, new telecentric optics are propos...
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