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Chemical amplification mechanisms for microlithography
Home
Publications
Chemical amplification mechanisms for microlithography
Chemical amplification mechanisms for microlithography
E. Reichmanis
E. Reichmanis
FH
F. M. Houlihan
F. M. Houlihan
ON
O. Nalamasu
O. Nalamasu
TN
T. X. Neenan
T. X. Neenan
Publisher Website
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1 May 1991
journal article
Published by
American Chemical Society (ACS)
in
Chemistry of Materials
Vol. 3
(3)
,
394-407
https://doi.org/10.1021/cm00015a009
Abstract
No abstract available
Cited
Cited by 182 articles
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