Development of a trench depth measurement system for VLSI dynamic random access memory vertical capacitor cells using an interferometric technique with a Michelson interferometer
- 15 August 1989
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 28 (16) , 3373-3381
- https://doi.org/10.1364/ao.28.003373
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.Keywords
This publication has 2 references indexed in Scilit:
- Trench depth measurement system for VLSI DRAM's capacitor cells using optical fiber and michelson interferometerJournal of Lightwave Technology, 1987
- Method for measuring the trench depth of a very-large-scale-integration dynamic random-access memory capacitor based on a Michelson interferometerOptics Letters, 1986