Low Dielectric Constant Materials for IC Intermetal Dielectric Applications: A Status Report on the Leading Candidates
- 1 January 1996
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Preparation And Properties Of Fluorinated Amorphous Carbon Thin Films By Plasma Enhanced Chemical Vapor DepositionMRS Proceedings, 1995
- Thermal And Mechanical Properties Of Polyimide FilmsMRS Proceedings, 1995
- Mechanisms of deposition and etching of thin films of plasma-polymerized fluorinated monomers in radio frequency discharges fed with C2F6-H2 and C2F6-O2 mixturesJournal of Applied Physics, 1987