Electron cyclotron resonance reactive ion etching of fine features in HgxCd1−xTe using CH4/H2 plasmas
- 1 July 1993
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 11 (4) , 1763-1767
- https://doi.org/10.1116/1.578421
Abstract
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