The kinetics of the reactions of silicon compounds. Part IV. Unimolecular gas-phase thermal decomposition of 2,2-difluoroethyltributoxysilane
- 1 January 1970
- journal article
- research article
- Published by Royal Society of Chemistry (RSC) in Journal of the Chemical Society B: Physical Organic
- p. 578-580
- https://doi.org/10.1039/j29700000578
Abstract
The gas-phase thermal decomposition of 2,2-difluoroethyltri-n-butoxysilane into vinyl fluoride and tri-n-butoxyfluorosilane shows first-order kinetics at 240–320° and 7–97 torr initial pressure. The reaction is homogeneous and unaffected by the addition of nitric oxide or propene. The first-order rate constant is pressure-independent and given by: log10k(sec.–1)=(10·25 ± 0·26)–(35,055 ± 660)/4·576T. It is concluded that the reaction is unimolecular and proceeds by a four-centre β-fluorine elimination similar to that found for other β-fluoroalkylsilicon compounds. Spectroscopic properties of tri-n-butoxyfluorosilane are reported.Keywords
This publication has 0 references indexed in Scilit: