Deposition of silica films by the oxidation of silane in oxygen
- 1 December 1978
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 55 (2) , 221-228
- https://doi.org/10.1016/0040-6090(78)90052-4
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- 281. The oxidation of the silicon hydrides. Part IJournal of the Chemical Society, 1935