Characterization of fluoropolymer films deposited by magnetron sputtering of poly(tetrafluoroethylene) and plasma polymerization of heptadecafluoro‐1‐decene (HDFD) on (100)‐oriented single‐crystal silicon substrates
- 1 August 2002
- journal article
- research article
- Published by Wiley in Surface and Interface Analysis
- Vol. 34 (1) , 10-18
- https://doi.org/10.1002/sia.1243
Abstract
No abstract availableKeywords
This publication has 24 references indexed in Scilit:
- Thermal Imidization of Fluorinated Poly(amic acid)s on Si(100) Surfaces Modified by Plasma Polymerization and Deposition of Glycidyl MethacrylateLangmuir, 2001
- Low dielectric constant polymers for microelectronicsProgress in Polymer Science, 2001
- Surface modification of poly(tetrafluoroethylene) films by plasma polymerization of glycidyl methacrylate and its relevance to the electroless deposition of copperJournal of Polymer Science Part A: Polymer Chemistry, 2000
- Plasmachemical Functionalization of Solid Surfaces with Low Surface Energy Perfluorocarbon ChainsLangmuir, 2000
- Pulsed plasma polymerization of an aromatic perfluorocarbon monomer: Formation of low dielectric constant, high thermal stability filmsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000
- Similarity of Plasma-Polymerized Tetrafluoroethylene and Fluoropolymer Films Deposited by rf Sputtering of Poly(tetrafluoroethylene)Langmuir, 1998
- Plasma Polymerization of Sputtered Poly(tetrafluoroethylene)The Journal of Physical Chemistry, 1995
- Time‐of‐flight secondary ion mass spectrometric analysis of polymer surfaces and additivesSurface and Interface Analysis, 1993
- Infrared spectra of amorphous and crystalline poly(tetrafluoroethylene)Macromolecules, 1985
- The properties of films prepared by the rf sputtering of PTFE and plasma polymerization of some freonsVacuum, 1981